STEGEMANN, Bert; SIXTENSSON, Daniel; LUSSKY, Thomas; BLOECK, Ulrike; SCHMIDT, Manfred. Ultrahigh Vacuum Preparation and Passivation of Abrupt SiO2/Si(111) Interfaces. CHIMIA, [S. l.], v. 61, n. 12, p. 826, 2007. DOI: 10.2533/chimia.2007.826. Disponível em: https://www.chimia.ch/chimia/article/view/2007_826. Acesso em: 22 jun. 2024.