Stegemann B, Sixtensson D, Lussky T, Bloeck U, Schmidt M. Ultrahigh Vacuum Preparation and Passivation of Abrupt SiO2/Si(111) Interfaces. Chimia [Internet]. 2007 Dec. 19 [cited 2024 Apr. 29];61(12):826. Available from: https://www.chimia.ch/chimia/article/view/2007_826