Trialkylsulfonium Ligands for the Robust Surface Passivation of Lead Halide Perovskite Nanocrystals

Authors

  • Oleksandr Kolomiiets Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Zurich, CH-8093, Switzerland; Laboratory for Thin Films and Photovoltaics, Empa − Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600, Switzerland https://orcid.org/0000-0001-9651-9103
  • Maryna Bodnarchuk Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Zurich, CH-8093, Switzerland; Laboratory for Thin Films and Photovoltaics, Empa − Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600, Switzerland https://orcid.org/0000-0001-6597-3266
  • Maksym Kovalenko Laboratory of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zurich, Zurich, CH-8093, Switzerland; Laboratory for Thin Films and Photovoltaics, Empa − Swiss Federal Laboratories for Materials Science and Technology, Dübendorf CH-8600, Switzerland https://orcid.org/0000-0002-6396-8938

DOI:

https://doi.org/10.2533/chimia.2026.212

Keywords:

Capping ligands, Colloids, Nanocrystals, Perovskites

Abstract

This study introduces a structurally diverse library of long-chain trialkylsulfonium ligands designed to provide surface stabilization of lead halide perovskite nanocrystals (LHP NCs). We evaluate the influence of ligand structure on binding affinity and demonstrate that sulfonium-based ligands offer effective passivation compared to traditional ammonium ligands. Notably, the resulting NCs exhibit exceptional stability at high dilutions and maintain integrity in industrially relevant manufacturing solvents for down-conversion layer production. This work highlights the potential of sulfonium-based ligands to stabilize and produce robust, high-performance perovskite NCs for photonics and optoelectronics.

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Published

2026-04-29

How to Cite

[1]
O. Kolomiiets, M. Bodnarchuk, M. Kovalenko, Chimia 2026, 80, 212, DOI: 10.2533/chimia.2026.212.