AbstractMicrolithography is a highly precise pattern-transfer technique, needed for the manufacturing of semiconductor devices. In the microlithographic process, the image of a mask is transferred to a light-sensitive polymer film, a so-called photoresist. Photoresists consist of light-sensitive organic polymers, which are able to resolve submicrometer patterns. They are highly specified materials, having well-defined physical and mechanical properties, and are mainly composed of a linear organic polymer, a photoacid generator, and a solvent.
How to Cite
U. Schaedeli, E. Tinguely, Chimia 1994, 48, 431, DOI: 10.2533/chimia.1994.431.
Copyright (c) 1994 Swiss Chemical Society
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